上海交大研究生院主页平台管理系统鞠生宏--中文主页-- Investigation on interfacial thermal resistance and phonon scattering at twist boundary of silicon

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中文主页 - 科学研究 - 论文成果

Investigation on interfacial thermal resistance and phonon scattering at twist boundary of silicon

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发表刊物：Journal of Applied Physics 113, 053513, 2013.

是否译文：否

发表时间：2013-02-01

论文类型：期刊论文

第一作者：鞠生宏

上一条：: An atomic level investigation of grain-size-dependent thermal conductivity of polycrystalline argon by molecular dynamics

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