上海交大研究生院主页平台管理系统 Shu Da--Home-- Diffusion mechanisms of vacancy and doped Si in Al3Ti from first-principles calculations

Language : 中文

Shu Da

Scientific Research: Research Field; Paper Publications; Patents; Published Books; Research Projects

Teaching Research: Teaching Resources; Teaching Information; Teaching Achievement

Current position: Home > Scientific Research > Paper Publications

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Journal:INTERMETALLICS

ISSN No.:0966-9795

Translation or Not:no

Date of Publication:2011-07-01

Indexed by:期刊论文

Date of Publication:2011-07-01

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