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Fabrication and evaluation of diamond thick film-Si3N4 brazed cutting tool by microwave plasma chemical vapor deposition method

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Journal:JOURNAL OF MATERIALS PROCESSING TECHNOLOGY

ISSN No.:0924-0136

Translation or Not:no

Date of Publication:2021-05-01

Indexed by:期刊论文

Date of Publication:2021-05-01

Pre One:Influence of boron doping level on the basic mechanical properties and erosion behavior of boron-doped micro-crystalline diamond (BDMCD) film

Next One:Effects of carbon concentration and gas pressure with hydrogen-rich gas chemistry on synthesis and characterizations of HFCVD diamond films on WC-Co substrates

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