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Structure and properties of Ti–Si–N films with ~10 at.% Si deposited using reactive magnetron sputtering with high-flux low-energy ion assistance

Date of Publication:2008-08-01 Hits:

Journal:Thin Solid Films
ISSN No.:0040-6090
Translation or Not:no
Date of Publication:2008-08-01
Indexed by:期刊论文

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