Journal:Key Engineering Materials ISSN No.:1013-9826 Translation or Not:no Date of Publication:2007-12-01 Indexed by:会议论文
Pre One:Structure and properties of Ti–Si–N films with ~10 at.% Si deposited using reactive magnetron sputtering with high-flux low-energy ion assistance
Next One:High-flux ion irradiation with energy of ~20 eV affecting phase segregation and low-temperature growth of nc-TiN/a-Si3N4 nanocomposite films
